Showing items related by title, author, creator and subject.

• Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides 

  Kunte, Girish V (2010-07-16)

  This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for ...

• Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics 

  Gairola, Anshita (2013-07-10)

  The work carried out as a part of this thesis has been focussed on understanding different aspects of the chemical vapor deposition process namely, ALD / MOCVD. A large part of the thesis is aimed at solving the problem ...

• Investigations On The Influence Of Process Parameters On The Deposition Of Samarium Cobalt (SmCo) Permanent Magnetic Thin Films For Microsystems Applications 

  Balu, R (2011-02-15)

  The research in permanent magnet thin films focuses on the search of new materials and methods to increase the prevalent data storage limit. In the recent past the work towards the application of these films to micro systems ...