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Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x

dc.contributor.advisorShivashankar, S A
dc.contributor.authorGoswami, Jaydeb
dc.date.accessioned2013-07-02T09:44:05Z
dc.date.accessioned2018-07-30T15:09:01Z
dc.date.available2013-07-02T09:44:05Z
dc.date.available2018-07-30T15:09:01Z
dc.date.issued2013-07-02
dc.date.submitted1995
dc.identifier.urihttps://etd.iisc.ac.in/handle/2005/2092
dc.identifier.abstracthttp://etd.iisc.ac.in/static/etd/abstracts/2693/G14454-Abs.pdfen_US
dc.language.isoen_USen_US
dc.relation.ispartofseriesG14454en_US
dc.subjectCuprate Superconductors - Vapor Depositionen_US
dc.subjectYettrium Superconductorsen_US
dc.subjectChemical Vapor Deposition (CVD)en_US
dc.subjectThin Copper Films - Chemical Vapor Depositionen_US
dc.subjectThin Film Depositionen_US
dc.subjectThin Filmsen_US
dc.subjectCopper Thin Filmsen_US
dc.subjectYBCO Filmsen_US
dc.subject.classificationManufacturing Engineeringen_US
dc.titleChemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-xen_US
dc.typeThesisen_US
dc.degree.namePhDen_US
dc.degree.levelDoctoralen_US
dc.degree.disciplineFaculty of Scienceen_US


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