A porous silica –silica composite was processed with varying fiber diameters using the slurry moulding technique. The advantage of the process was that the density of the composite could be processed to the required levels. ...

The research work presented in this thesis reports for the first time the fabrication of Titanium Niobium complex oxide (TiNb2O7 (TNO)) thin films by employing pulsed laser deposition and their use as the anode material ...

This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for ...

Metal Oxide (MO)semiconductors are one of the most widely used materials in commercial gas sensor devices. The basic principle of chemoresistive gas sensor operation stems on the high sensitivity of electrical resistance ...

There are many challenges in materializing the applications utilizing inorganic nanoparticles. The primary drawback is the degradation of properties due to aggregation and sintering either due to elevated temperatures or ...

Monitoring the working environment of laboratories and industries for pollutants is of primary concern to ensure the healthiness of working personnel. Semiconducting metal oxides (SMOs) are sensitive to the gas ambience ...

This thesis deals with the research work carried out for the development of novel applications by integrating biomolecules with various nanostructures. The thesis is organized as follows: Chapter 1 reviews the properties ...

Transition Metal Silicides (TMS) are well known refractory materials because of their high thermal and structural stability at elevated temperature. In addition TMS materials are known for their moderate thermoelectric ...

Magnetorheological fluids (MRFs) are non-colloidal stable suspensions of polarizable mesoscale soft magnetic particles, usually metallic Fe-particles, in a carrier liquid such as oil or water; the solidity of which can be ...

The present work has been focused on the growth of Group III-nitride epitaxial layers and nanostructures on Si (111) substrates by plasma-assisted molecular beam epitaxy. Silicon is regarded as a promising substrate for ...