Now showing items 1-2 of 2
Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides
This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for ...
Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3
Thin films and coatings of oxides are used in various fields of science and technology, such as semiconductor and optoelectronic devices, gas sensors, protective and wear resistant coatings etc. Of late, there has been a ...