Low-pressure mocvd of oxide dielectrics : a study of their growth, microstructure, and properties

dc.contributor.advisor	Shivashankar, S A
dc.contributor.author	Singh, Mangala Prasad
dc.date.accessioned	2026-03-12T11:29:16Z
dc.date.available	2026-03-12T11:29:16Z
dc.date.submitted	2003
dc.identifier.uri	https://etd.iisc.ac.in/handle/2005/9404
dc.description.abstract	Abstract not available
dc.language.iso	en_US
dc.relation.ispartofseries	T05574
dc.rights	I grant Indian Institute of Science the right to archive and to make available my thesis or dissertation in whole or in part in all forms of media, now hereafter known. I retain all proprietary rights, such as patent rights. I also retain the right to use in future works (such as articles or books) all or part of this thesis or dissertation
dc.subject	Metalorganic Chemical Vapor Deposition
dc.subject	Heteroatom Incorporation
dc.subject	Rare?Earth Oxide Dielectrics
dc.title	Low-pressure mocvd of oxide dielectrics : a study of their growth, microstructure, and properties
dc.type	Thesis
dc.degree.name	PhD
dc.degree.level	Doctoral
dc.degree.grantor	Indian Institute of Science
dc.degree.discipline	Science