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    Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3 

    Dagur, Pritesh (2010-04-08)
    Thin films and coatings of oxides are used in various fields of science and technology, such as semiconductor and optoelectronic devices, gas sensors, protective and wear resistant coatings etc. Of late, there has been a ...

    Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides 

    Kunte, Girish V (2010-07-16)
    This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for ...

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    AuthorDagur, Pritesh (1)Kunte, Girish V (1)SubjectAtomic Layer Deposition (ALD) (2)
    Chemical Vapour Deposition (CVD) (2)
    Thin Film Deposition (2)Aluminium Gallium Oxide (1)Electronic Engineering (1)Materials Science (1)Metalorganic Complexes - Synthesis (1)Metalorganic Precursors (1)Thin Film Technology (1)Titanium Oxide Deposition (1)... View MoreDate Issued
    2010 (2)
    Has File(s)Yes (2)

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