Browsing Materials Research Centre (MRC) by Subject "Atomic Layer Deposition (ALD)"
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Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics
(2013-07-10)The work carried out as a part of this thesis has been focussed on understanding different aspects of the chemical vapor deposition process namely, ALD / MOCVD. A large part of the thesis is aimed at solving the problem ... -
Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3
(2010-04-08)Thin films and coatings of oxides are used in various fields of science and technology, such as semiconductor and optoelectronic devices, gas sensors, protective and wear resistant coatings etc. Of late, there has been a ... -
Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides
(2010-07-16)This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for ...