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MOCVD Of Carbonaceous MnO Coating : Electrochemical And Charge Transport Studies
(2011-01-17)
Metalorganic Chemical Vapour Deposition (MOCVD) is a versatile technique for the deposition of thin films of oxide materials as it offers advantages, such as deposition over large surface area, conformal coverage, selective ...
Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides
(2010-07-16)
This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for ...