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Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides
(2010-07-16)
This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for ...
MOCVD Of Carbonaceous MnO Coating : Electrochemical And Charge Transport Studies
(2011-01-17)
Metalorganic Chemical Vapour Deposition (MOCVD) is a versatile technique for the deposition of thin films of oxide materials as it offers advantages, such as deposition over large surface area, conformal coverage, selective ...