| dc.contributor.advisor | Ramakrishna, B S | |
| dc.contributor.author | Nagaraja, H S | |
| dc.date.accessioned | 2026-03-10T09:29:35Z | |
| dc.date.available | 2026-03-10T09:29:35Z | |
| dc.date.submitted | 1971 | |
| dc.identifier.uri | https://etd.iisc.ac.in/handle/2005/8911 | |
| dc.description.abstract | Abstract not available | |
| dc.language.iso | en_US | |
| dc.relation.ispartofseries | T00898 | |
| dc.rights | I grant Indian Institute of Science the right to archive and to make available my thesis or dissertation in whole or in part in all forms of media, now hereafter known. I retain all proprietary rights, such as patent rights. I also retain the right to use in future works (such as articles or books) all or part of this thesis or dissertation | |
| dc.subject | Diffusion process | |
| dc.subject | Doped semiconductors | |
| dc.subject | Impurity penetration | |
| dc.title | Temperature control of diffusion furnaces | |
| dc.type | Thesis | |
| dc.degree.name | Msc Engg | |
| dc.degree.level | Masters | |
| dc.degree.grantor | Indian Institute of Science | |
| dc.degree.discipline | Engineering | |
