dc.contributor.advisor | Sambandan, Sanjiv | |
dc.contributor.author | Rex, A | |
dc.date.accessioned | 2021-09-22T04:14:22Z | |
dc.date.available | 2021-09-22T04:14:22Z | |
dc.date.submitted | 2018 | |
dc.identifier.uri | https://etd.iisc.ac.in/handle/2005/5319 | |
dc.description.abstract | Buckled Thin Film Transistor (TFT) resulting from the stress induced instability
of thin films realized on a
exible substrate can behave di erently than that of
a planar device. The aim of this thesis is twofold: To understand the in
uence
of the buckled geometry on the device physics of TFT & How can we use this
characteristics to design circuits area e ciently. The study comprises of theoretical
estimates, simulations and experimental investgations.
Theoretical estimates of the buckled geometry's in
uence on the two important
variables: unit area gate capacitance Ci and, electrostatic potential ' are presented
as a function of the interface curvature. Simulation results to elucidate these
estimations are presented. As per the classification followed, the applied stress
is fundamental towards the naturally buckled geometry. Drain to source current
(IDS) of the Naturally Buckled TFTs (NBTs), as per the theory, depends on the
angle between the direction of applied stress and channel. While in the case of the
stress perpendicular to the channel, integral of the Ci curve within the wavelength
of the NBTs is the governing factor, for stress parallel case, integral of the invese
Ci is the governing factor. Simulation results presented in this regards are in
agreement with this theory. Extreme assymetricity in the buckling, which is the
case of pure bending is also studied. While for the case of the pure bending
leading to the field amplification at the channel region, increment in the IDS is
expected, for the attenuation case, as per the theory IDS decreases. Simulation
results presented in this regards are in agreement with the theory.
As per the classification followed, realizing non-planar gate geometry, on top of
which TFTs are fabricated is fundamental towards the Artificially Buckled TFTs
(ABTs). In case of ABTs, as per the theory, the Ci profile becomes a function of
Pitch and Height of the gate geometry's unit element. Such feature of ABTs can
in
uence the effective layout area of the ABTs. Derived transconductances from
the simulated IV characteristics are analyzed to elucidate this e ect. Simulated
Voltage Transfer Characteristics of the n-channel only CSAs with the ABTs as a
load device is in agreemnet with the theory.
Experimental results to verify the in
uence of artificially buckled geometry on
the TFT and amplifier design is presented. | en_US |
dc.language.iso | en_US | en_US |
dc.relation.ispartofseries | ;G29391 | |
dc.rights | I grant Indian Institute of Science the right to archive and to make available my thesis or dissertation in whole or in part in all forms of media, now hereafter known. I retain all proprietary rights, such as patent rights. I also retain the right to use in future works (such as articles or books) all or part
of this thesis or dissertation | en_US |
dc.subject | Buckled Thin Film Transistor | en_US |
dc.subject | Thin Film Transistor | en_US |
dc.subject | Thin films | en_US |
dc.subject.classification | Research Subject Categories::TECHNOLOGY::Electrical engineering, electronics and photonics | en_US |
dc.title | Interplay between the Mechanics of Flexible Substrates and Performance of Thin Film Transistors: Role of Buckled Geometry | en_US |
dc.type | Thesis | en_US |
dc.degree.name | PhD | en_US |
dc.degree.level | Doctoral | en_US |
dc.degree.grantor | Indian Institute of Science | en_US |
dc.degree.discipline | Faculty of Science | en_US |