Browsing Instrumentation and Applied Physics (IAP) by Subject "Si3N4 Films"
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ECR Assisted Deposition of Tin And Si3N4 Thin Films For Microelectronic Applications
(Indian Institute of Science, 2006-02-27)The broad theme of the present research investigation is Ion Assisted Deposition of thin films and its effect on the properties of thin films. Though this activity has been of interest to researchers for more than a decade, ...