Browsing Instrumentation and Applied Physics (IAP) by Author "Jajala, Bujjamma"
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Ion Assisted Deposition Of HfO2 Thin Films For CMOS Gate Dielectric Applications
Jajala, Bujjamma (2013-09-13)The scaling down of Complementary Metal Oxide Semiconductor (CMOS) transistors to sub-100nm requires replacement of conventional Silicon dioxide layer with high dielectric constant (K) material for gate dielectric. Among ...