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dc.contributor.advisorMahapatra, Santanu
dc.contributor.authorSharan, Neha
dc.date.accessioned2018-05-08T06:55:35Z
dc.date.accessioned2018-07-31T04:34:51Z
dc.date.available2018-05-08T06:55:35Z
dc.date.available2018-07-31T04:34:51Z
dc.date.issued2018-05-08
dc.date.submitted2014
dc.identifier.urihttps://etd.iisc.ac.in/handle/2005/3489
dc.identifier.abstracthttp://etd.iisc.ac.in/static/etd/abstracts/4356/G26589-Abs.pdfen_US
dc.description.abstractCompact Models are the physically based accurate mathematical description of the cir-cuit elements, which are computationally efficient enough to be incorporated in circuit simulators so that the outcome becomes useful for the circuit designers. As the multi-gate MOSFETs have appeared as replacements for bulk-MOSFETs in sub-32nm technology nodes, efficient compact models for these new transistors are required for their successful utilization in integrated circuits. Existing compact models for common double-gate (CDG) MOSFETs are based on the fundamental assumption of having symmetric gate oxide thickness. In this work we explore the possibility of developing models without this approximation, while preserving the computational efficiency at the same level. Such effort aims to generalize the compact model and also to capture the oxide thickness asymmetry effect, which might prevail in practical devices due to process uncertainties and thus affects the device performance significantly. However solution to this modeling problem is nontrivial due to the bias-dependent asym-metric nature of the electrostatic. Using the single implicit equation based Poisson so-lution and the unique quasi-linear relationship between the surface potentials, previous researchers of our laboratory have reported the core model for such asymmetric CDG MOSFET. In this work effort has been put to include Non-Quasistatic (NQS) effects, different small-geometry effects, and noise model to this core, so that the model becomes suitable for practical applications. It is demonstrated that the quasi-linear relationship between the surface potentials remains preserved under NQS condition, in the presence of all small geometry effects. This property of the device along with some other new techniques are used to develop the model while keeping the mathematical complexity at the same level of the models reported for the symmetric devices. Proposed model is verified against TCAD simulation for various device geometries and successfully imple-mented in professional circuit simulator. The model passes the source/drain symmetry test and good convergence is observed during standard circuit simulations.en_US
dc.language.isoen_USen_US
dc.relation.ispartofseriesG26589en_US
dc.subjectMetal Semiconductor Field Effect Transistors (MOSFET)en_US
dc.subjectCommon Double Gate (CDG) MOSFETs-Compact Modelingen_US
dc.subjectElectronic Circuits-Designen_US
dc.subjectTransistor Circuitsen_US
dc.subjectMOSFETs-Core Modelen_US
dc.subjectDouble Gate MOSFETsen_US
dc.subjectAsymmetric CDG MOSFETsen_US
dc.subjectSemiconductor Device Modelingen_US
dc.subjectGate Oxide Thickness Asymmetryen_US
dc.subjectGate Oxide Asymmetryen_US
dc.subject.classificationElectronic Systems Engineeringen_US
dc.titleCompact Modeling of Short Channel Common Double Gate MOSFET Adapted to Gate-Oxide Thickness Asymmetryen_US
dc.typeThesisen_US
dc.degree.namePhDen_US
dc.degree.levelDoctoralen_US
dc.degree.disciplineFaculty of Engineeringen_US


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