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dc.contributor.advisorMohan, S
dc.contributor.authorSumesh, M A
dc.date.accessioned2011-10-04T05:56:10Z
dc.date.accessioned2018-07-31T06:04:14Z
dc.date.available2011-10-04T05:56:10Z
dc.date.available2018-07-31T06:04:14Z
dc.date.issued2011-10-04
dc.date.submitted2005
dc.identifier.urihttps://etd.iisc.ac.in/handle/2005/1459
dc.identifier.abstracthttp://etd.iisc.ac.in/static/etd/abstracts/1878/G19583-Abs.pdfen_US
dc.language.isoen_USen_US
dc.relation.ispartofseriesG19583en_US
dc.subjectThin Filmsen_US
dc.subjectDirect Current Magnetron Sputter Depositionen_US
dc.subjectThin Film Depositionen_US
dc.subjectNickel Titanium Thin Filmsen_US
dc.subjectNickel Titanium Shape Memory Alloysen_US
dc.subjectMartensitic Transformationsen_US
dc.subjectShape Memory Effecten_US
dc.subjectShape Memory Alloy (SMA)en_US
dc.subjectSputter Depositionen_US
dc.subjectNiTi Thin Filmsen_US
dc.subjectMagnetron Sputteringen_US
dc.subjectMosaic Target Synthesisen_US
dc.subjectNiTi Shape Memory Alloyen_US
dc.subject.classificationInstrumentationen_US
dc.titleInvestigations On The Effect Of Process Parameters On The Composition Of DC Magnetron Sputter Deposited NiTi Shape Memory Alloy Thin Filmsen_US
dc.typeThesisen_US
dc.degree.nameMSc Enggen_US
dc.degree.levelMastersen_US
dc.degree.disciplineFaculty of Engineeringen_US


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