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MOCVD Of Carbonaceous MnO Coating : Electrochemical And Charge Transport Studies
(2011-01-17)
Metalorganic Chemical Vapour Deposition (MOCVD) is a versatile technique for the deposition of thin films of oxide materials as it offers advantages, such as deposition over large surface area, conformal coverage, selective ...
Thin Films Of A Carbonaceous Copper Oxide, Li Doped Cobalt Oxide And Li At Nanometric Dimension : Synthesis Through CVD, Solgel And Electromagnetic Irradiation And Characterisation
(2009-09-14)
Thin film nanostructures may be defined as assemblies, arrays, or randomly distributed nanoparticles, nanowires, or nanotubes, which together form a layer of materials supported on a substrate surface. Because such ...
Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3
(2010-04-08)
Thin films and coatings of oxides are used in various fields of science and technology, such as semiconductor and optoelectronic devices, gas sensors, protective and wear resistant coatings etc. Of late, there has been a ...
Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides
(2010-07-16)
This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for ...