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    Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics 

    Gairola, Anshita (2013-07-10)
    The work carried out as a part of this thesis has been focussed on understanding different aspects of the chemical vapor deposition process namely, ALD / MOCVD. A large part of the thesis is aimed at solving the problem ...

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    AuthorGairola, Anshita (1)SubjectAtomic Layer Deposition (ALD) (1)
    Chemical Vapor Deposition (CVD) (1)
    Dielectrics (1)
    Materials Science (1)
    Metalorganic Chemical Vapor Deposition (1)
    Metaloxide Thin Films (1)MOCVD (1)Physical Vapor Deposition (PVD) (1)
    Thin Film Deposition (1)
    Thin Films (1)
    ... View MoreDate Issued2013 (1)Has File(s)Yes (1)

    etd@IISc is a joint service of SERC & J R D Tata Memorial (JRDTML) Library || Powered by DSpace software || DuraSpace
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